Plasma Etching of Composite Silicide Gate Electrodes
| Autor: | C.W. Koburger, H. J. Geipel, D. L. Harmon, Francis Roger White |
|---|---|
| Rok vydání: | 1982 |
| Předmět: |
Materials science
Plasma etching Renewable Energy Sustainability and the Environment business.industry Composite number Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound chemistry Etching (microfabrication) Electrode Silicide Materials Chemistry Electrochemistry Optoelectronics Dry etching Reactive-ion etching business Plasma processing |
| Zdroj: | Journal of The Electrochemical Society. 129:1330-1335 |
| ISSN: | 1945-7111 0013-4651 |
| DOI: | 10.1149/1.2124130 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|