Photosensitive resist system composed of phenolic resin and aromatic azide

Autor:	Saburo Nonogaki, Minoru Toriumi
Rok vydání:	1990
Předmět:	Materials science Polymers and Plastics Organic Chemistry Cresol Condensed Matter Physics Photochemistry chemistry.chemical_compound Spectral sensitivity chemistry Photosensitivity Resist Polymer chemistry Materials Chemistry medicine Phenol Azide Lithography medicine.drug
Zdroj:	Makromolekulare Chemie. Macromolecular Symposia. 33:233-241
ISSN:	0258-0322
DOI:	10.1002/masy.19900330120
Popis:	Phenolic resins such as cresol novolac and poly-(p-hydroxystyrene) are photosensitized by the addition of an aromatic azide to give negative-working photoresists. The spectral sensitivity can be varied from deep UV to visible region by changing the kind of azide. The system composed of poly(p-hydroxystyrene) and a phenol ester of p-azidobenzenesulfonic acid is expected to be useful in deep UV fine-line lithography. The system containing 23 wt% of p-n-pentylphenol p-azidobenzenesulfonate exhibits a photosensitivity about 50 mJ/cm2 at the wavelength of 248 nm.
Databáze:	OpenAIRE
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