Fast extraction of defect size distribution using a single layer short flow NEST structure
| Autor: | Larg Weiland, Christopher Hess, K. Miyamoto, D. Stashower, Gaurav Verma, K. Inoue, Brian E. Stine |
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| Rok vydání: | 2001 |
| Předmět: |
Materials science
Yield (engineering) Computer simulation Monte Carlo method Process (computing) Test method Condensed Matter Physics Chip Industrial and Manufacturing Engineering Electronic Optical and Magnetic Materials Electronic engineering Process control Electrical measurements Electrical and Electronic Engineering Biological system |
| Zdroj: | IEEE Transactions on Semiconductor Manufacturing. 14:330-337 |
| ISSN: | 0894-6507 |
| Popis: | Defect inspection is required for process control and to enhance chip yield. Electrical measurements of test structures are commonly used to detect faults. To improve accuracy of electrically based determination of defect densities and defect size distributions, we present a novel NEST structure. There, many nested serpentine lines will be placed within a single layer only. This mask will be used as a short flow to guarantee a short turn around time for fast process data extraction. Data analysis procedures will provide densities and size distributions of killer defects that will have an impact on product chip yield. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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