Modes of rf capacitive discharge in low-pressure sulfur hexafluoride
Autor: | Valeriy Lisovskiy, K. Landry, V. Cassagne, J. Jolly, Vladimir Yegorenkov, S. Martins, D. Douai, Jean-Paul Booth |
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Rok vydání: | 2007 |
Předmět: |
Acoustics and Ultrasonics
Condensed Matter Physics Dissociation (chemistry) Surfaces Coatings and Films Electronic Optical and Magnetic Materials Anode Sulfur hexafluoride chemistry.chemical_compound chemistry Ionization Electron temperature Atomic physics Ionization energy Electron ionization Voltage |
Zdroj: | Journal of Physics D: Applied Physics. 40:6989-6999 |
ISSN: | 1361-6463 0022-3727 |
DOI: | 10.1088/0022-3727/40/22/020 |
Popis: | This paper presents the results of an experimental study of rf capacitive discharge in low-pressure SF6. The rf discharge in SF6 is shown to exist not only in weak-current (α-) and strong-current (γ-) modes but also in a dissociative δ-mode. This δ-mode is characterized by a high degree of SF6 dissociation, high plasma density, electron temperature and active discharge current, and it is intermediate between α- and γ-modes. The δ-mode appears due to a sharp increase in the dissociation rate of SF6 molecules via electron impact starting after a certain threshold value of rf voltage. At the same time the threshold ionization energy of SFx (x = 1–5) radicals formed is below the ionization potential of SF6 molecules. The double layer existing in the anode phase of the near-electrode sheath is shown to play an important role in sustaining the α- mode as well as the δ-mode but it is not a cause of the rf discharge transition from α- to δ-mode. |
Databáze: | OpenAIRE |
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