Effect of nitrogen plasma on the mechanical and electrical properties of plasma-enhanced atomic layer deposited TiN films

Autor:	Jeong Woo Shin, Jaehyeong Lee, Keunhoi Kim, Chansong Kwon, Young Bin Park, Heesung Park, Kwanlae Kim, Hyo Suk Ahn, Dongha Shim, Jihwan An
Rok vydání:	2022
Předmět:	Process Chemistry and Technology Materials Chemistry Ceramics and Composites Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Ceramics International. 48:25651-25655
ISSN:	0272-8842
DOI:	10.1016/j.ceramint.2022.05.273
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b799c625b5a8b36ca96a1da03137c27f https://doi.org/10.1016/j.ceramint.2022.05.273 Zobrazit plný text záznamu Full Text from ScienceDirect