Anisotropic temperature distribution causing an incremental trend in the saturated drain-current of SiC MOSFET

Autor: Shogo Ogawa, Taketoshi Tanaka, Yohei Nakamura, Ken Nakahara
Rok vydání: 2020
Zdroj: Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials.
DOI: 10.7567/ssdm.2020.d-6-02
Databáze: OpenAIRE