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A new device for rapid non-contact characterization of roughness spatial distribution of flat surfaces is developed. Its operational principle is based on the strong dependence on roughness of the intensity of x-rays reflected from a superpolished surface. This effect may be used to obtain a two-dimensional map of the roughness spatial distribution for flat surfaces with a rms. roughness height of the order of one nanometre. The key components of this device are a precision mechanical one-dimensional scanning stage, a parabolic collimator with vacuum beam path, and a temperaturestabilized cooled x-ray linear detector array.Keywords: roughness, x-ray, reflection, scanning, linear detector 1. INTRODUCTION Progress in microelectronics, computer component technology, and x-ray and laser optics demands manufacture ofsupersmooth flat surfaces with nanometre-scale roughness, such as silicon semiconductor wafers, computer hard disks,and x-ray and laser mirror substrates. These practical tasks stimulate the search for efficient methods for monitoring theroughness of surfaces with an area of 100 square centimetres and larger. Today there are four major methods used to |
