The effect of non-isoplanatism in micrographs taken with an electron microscope equipped with a field emission gun
| Autor: | G. Ade, Karl-Joseph Hanszen, Rolf Lauer |
|---|---|
| Rok vydání: | 1985 |
| Předmět: |
Physics
Conventional transmission electron microscope Micrograph business.industry Low-voltage electron microscope Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention Optics law Scanning transmission electron microscopy Electron microscope Short exposure business Field emission gun Instrumentation Environmental scanning electron microscope |
| Zdroj: | Ultramicroscopy. 16:47-57 |
| ISSN: | 0304-3991 |
| DOI: | 10.1016/s0304-3991(85)80007-3 |
| Popis: | In an electron microscope equipped with a field emission gun, highly magnified micrographs can be taken within short exposure times by reducing the distance between the object and the effective crossover down to 7 μm. Due to the dependence of the Seidel aberrations on the pupil position, the isoplanatic patch is found to be severely restricted. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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