Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective
| Autor: | Zhixiang Liu, Baobin Lv, Yadong Jiang, Xing Tingwen |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
Diffraction
Physics Wavefront Zernike polynomials business.industry Astrophysics::Instrumentation and Methods for Astrophysics General Engineering Physics::Optics 02 engineering and technology Grating 021001 nanoscience & nanotechnology 01 natural sciences Atomic and Molecular Physics and Optics Numerical aperture 010309 optics symbols.namesake Fourier transform Optics 0103 physical sciences symbols 0210 nano-technology Shearing interferometer business Diffraction grating |
| Zdroj: | Optical Engineering. 57:1 |
| ISSN: | 0091-3286 |
| DOI: | 10.1117/1.oe.57.2.024107 |
| Popis: | A two-dimensional (2-D) shearing interferometer based on an amplitude chessboard grating was designed to measure the wavefront aberration of a high numerical-aperture (NA) objective. Chessboard gratings offer better diffraction efficiencies and fewer disturbing diffraction orders than traditional cross gratings. The wavefront aberration of the tested objective was retrieved from the shearing interferogram using the Fourier transform and differential Zernike polynomial-fitting methods. Grating manufacturing errors, including the duty-cycle and pattern-deviation errors, were analyzed with the Fourier transform method. Then, according to the relation between the spherical pupil and planar detector coordinates, the influence of the distortion of the pupil coordinates was simulated. Finally, the systematic error attributable to grating alignment errors was deduced through the geometrical ray-tracing method. Experimental results indicate that the measuring repeatability (3σ) of the wavefront aberration of an objective with NA 0.4 was 3.4 mλ. The systematic-error results were consistent with previous analyses. Thus, the correct wavefront aberration can be obtained after calibration. |
| Databáze: | OpenAIRE |
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