Thermoelectric properties of electrodeposited CuNi alloys on Si
Autor: | Saulo Güths, André A. Pasa, R. G. Delatorre, M. L. Sartorelli, A.Q. Schervenski |
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Rok vydání: | 2003 |
Předmět: | |
Zdroj: | Journal of Applied Physics. 93:6154-6158 |
ISSN: | 1089-7550 0021-8979 |
DOI: | 10.1063/1.1569432 |
Popis: | Thin films with the composition of the constantan alloy (a solid solution with 35 to 50 wt. % of Ni in Cu) have a high-thermoelectric power, which allows the fabrication of very sensitive heat-flux sensors based on planar technology. In this article, the thermoelectric properties of CuxNi100−x thin films electrodeposited on silicon were studied as a function of the composition, temperature, and thickness. The electrodeposition of thin layers on silicon is an important step for the integration of thermal sensors with semiconductor technology. The CuxNi100−x alloys were electrodeposited potentiostatically at room temperature, from a citrate electrolyte containing both copper and nickel sulfates. The layer composition was controlled by the applied potential in the range from pure copper (at −0.4 V/SCE) up to a solid solution of about 25 wt. % Cu in Ni (at −1.2 V/SCE). Extremely high values of thermoelectric power were measured for very thin layers of Cu40Ni60 on Si, showing a strong influence of the substrate. By considering the system as a thermoelectric bilayer and extracting the contribution of the semiconductor, thermopower values for the Cu40Ni60 alloys comparable to the expected ones for constantan wires were obtained. |
Databáze: | OpenAIRE |
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