| Autor: |
J.E. Mynard, K.G. Stephens, E. Pasztor, P.L.F. Hemment, C. J. Richmond |
| Rok vydání: |
1983 |
| Předmět: |
|
| Zdroj: |
Ion Implantation: Equipment and Techniques ISBN: 9783642691584 |
| DOI: |
10.1007/978-3-642-69156-0_4 |
| Popis: |
A new 400 keV Research Implanter at the University of Surrey is described. The beam is extracted from a Freeman type source at 40 kV, analysed by a Lintott Separator magnet with adjustable pole pieces which match the beam to the ion optics of a cylindrical electrostatic lens/accelerator system. Electrostatic elements further transport the beam and incorporate two neutral particle traps and electrostatic beam scanning over a maximum area of 100mm x 100mm. Beam diagnostics include calorimeters for current and power density determinations and facilities for IR wafer temperature and beam purity measurements during implantation. Samples are loaded through an air lock using a UHV compatible transporter which includes provisions for sample cooling or heating. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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