Monitoring of Heavy Metal Contamination during Chemical Cleaning with Surface Photovoltage
| Autor: | Jacek Lagowski, L. Jastrzebski, E. Persson, Damon K. DeBusk, R. Witowski, K. Nauka, M. Dexter, O. Milic, M. Gordon |
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| Rok vydání: | 2019 |
| Předmět: |
Metal contamination
Renewable Energy Sustainability and the Environment Chemistry Surface photovoltage Diffusion Analytical chemistry Mineralogy Contamination Condensed Matter Physics Chemical cleaning Surfaces Coatings and Films Electronic Optical and Magnetic Materials Metal visual_art Materials Chemistry Electrochemistry visual_art.visual_art_medium Surface charge Rapid thermal annealing |
| Zdroj: | Journal of The Electrochemical Society. 140:1152-1159 |
| ISSN: | 1945-7111 |
| DOI: | 10.1149/1.2056215 |
| Popis: | This paper presents surface photovoltage (SPV) applications for the monitoring of chemical cleaning and purity of chemicals through mapping of minority carrier diffusion length, Fe concentration in the bulk, and surface contamination (surface charge and surface recombination). The noncontact, wafer-scale character of the new SPV approach and refined apparatus make this technique uniquely suited for heavy metal monitoring. This method was used to monitor Cu contamination in BHF by measurement of its effect on surface recombination and Fe contamination through it effect on bulk recombination after the rapid thermal annealing step used to drive Fe deposited at the surface during cleaning into the bulk |
| Databáze: | OpenAIRE |
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