Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

Autor:	Michel Touzeau, Ludovic de Poucques, Caroline Boisse-Laporte, Jean-Christophe Imbert, Petr Vašina, J. Bretagne, Lionel Teulé-Gay
Rok vydání:	2005
Předmět:	Argon Absorption spectroscopy Buffer gas Analytical chemistry chemistry.chemical_element Condensed Matter Physics Ion source chemistry Physics::Plasma Physics Physics::Atomic and Molecular Clusters Plasma diagnostics Light emission Physics::Chemical Physics Spectroscopy Titanium
Zdroj:	Plasma Sources Science and Technology. 14:321-328
ISSN:	1361-6595 0963-0252
DOI:	10.1088/0963-0252/14/2/014
Popis:	This paper deals with the characterization of an ionized physical vapour deposition (IPVD) reactor using an additional microwave plasma. The IPVD reactor was spatially characterized using optical emission spectroscopy, optical absorption spectroscopy and Langmuir probe measurements. A rectangular titanium target was used, the buffer gas was argon and the pressure was fixed at 4 Pa. The influence of the microwave power (between 0 and 900 W) and the magnetron discharge current (0.5 and 2 A) on the densities of the titanium species (neutral and ionic), argon emission line intensity and titanium and argon temperature variations was investigated. The titanium temperature and densities were measured using the pulsed resonant absorption spectroscopy technique. The neutral and ion fluxes on the substrate were deduced from these measurements. It was found that the ratio (Ti+)/(Tin) increases by a factor of 30 when additional microwave plasma is used. Moreover, we point out the temperature as a key parameter in plasma diagnostic interpretations.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b45cec92a4070a5cc82dc414ce24c0a6 https://doi.org/10.1088/0963-0252/14/2/014 Zobrazit plný text záznamu