Control of the structure and properties of aluminum oxide coatings deposited by pulsed magnetron sputtering
| Autor: | Peter Kelly, R. D. Arnell |
|---|---|
| Rok vydání: | 1999 |
| Předmět: |
Materials science
Scanning electron microscope Direct current Oxide Analytical chemistry Surfaces and Interfaces Sputter deposition Condensed Matter Physics Surfaces Coatings and Films Electric arc chemistry.chemical_compound chemistry Sputtering Deposition (phase transition) Composite material Layer (electronics) |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:945-953 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.581669 |
| Popis: | Alumina coatings offer the potential to protect metallic components operating in hostile corrosive, or oxidative environments. Until recently, though, the high rate deposition of fully dense, defect-free oxide coatings has proved extremely difficult. Oxide coatings can be produced by the reactive direct current (dc) sputtering of a metallic target in an oxygen atmosphere, or by radio frequency sputtering of an oxide target. The latter process results in very low deposition rates and is difficult to scale up for commercial applications. Reactive dc sputtering of highly insulating materials, such as alumina, is also problematic. The build up of an insulating layer on the surface of the target causes arcing. Arc events affect the stability of the deposition process and can adversely effect the structure and properties of the growing film. However, a new technique, pulsed magnetron sputtering, has been developed which significantly increases the viability of producing this type of material. It has been shown ... |
| Databáze: | OpenAIRE |
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