SU-8 focus control mirrors released by XeF 2 dry etch

Autor:	David L. Dickensheets, Sarah J. Lukes
Rok vydání:	2011
Předmět:	Microelectromechanical systems Materials science Silicon business.industry technology industry and agriculture chemistry.chemical_element Deformable mirror Surface micromachining Spherical aberration Optics chemistry Etching (microfabrication) Microscopy Dry etching business
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.877077
Popis:	SU8-2002 deformable membrane mirrors for primary focus control and compensation of focus-induced spherical aberration have been fabricated using a surface micromachining process with dry etching of silicon in XeF 2 . This process has a higher yield and realizes larger mirrors with a twofold improvement in stroke, relative to a wet release etch process previously described. The use of 3 mm x 4.24 mm elliptical mirrors for 45° incidence focus control in microscopy is described.
Databáze:	OpenAIRE
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