Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System

Autor:	Song Hu, Wei Yan, Wangfu Chen, Wenbo Jiang, Lixin Zhao, Yong Yang, Shaolin Zhou
Rok vydání:	2009
Předmět:	Fabrication Materials science business.industry General Chemistry Condensed Matter Physics Line width Whole systems Computational Mathematics Optics General Materials Science Lower cost Electrical and Electronic Engineering business Lithography Nanoscopic scale Maskless lithography
Zdroj:	Journal of Computational and Theoretical Nanoscience. 6:1170-1174
ISSN:	1546-1963 1546-1955
DOI:	10.1166/jctn.2009.1161
Popis:	In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b3ed762fbb571fa231237372dbd20512 https://doi.org/10.1166/jctn.2009.1161 Zobrazit plný text záznamu