E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating

Autor:	S D Poletaev, Nikolay L. Kazanskiy, Vladimir V. Podlipnov, Sergey A. Fomchenkov, Roman V. Skidanov, Muhammad Ali Butt
Rok vydání:	2016
Předmět:	History Bayer filter Fabrication Materials science business.industry Physics::Optics Dielectric Grating Electric flux Computer Science Applications Education Condensed Matter::Materials Science Optics Optoelectronics Thin film business Lithography Electron-beam lithography
Zdroj:	Journal of Physics: Conference Series. 741:012150
ISSN:	1742-6596 1742-6588
DOI:	10.1088/1742-6596/741/1/012150
Popis:	The main idea of this work was to determine the optimized parameters of E-beam lithography to obtain metal grating over dielectric thin film. This combination of metal/dielectric can provide high transmission spectrum of RGB colors. Different electric flux densities were used during E-beam writing and the best resolution and symmetric periodicity was obtained at 53 μC/cm2 dose.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b3b4ddd4b3a153b2013d1073b676b34b https://doi.org/10.1088/1742-6596/741/1/012150 Zobrazit plný text záznamu