Damage induced in materials by ion implantation

Autor:	M.S. Mathur, M. Liu, D. He, J.S.C. McKee
Rok vydání:	1997
Předmět:	Materials science Atomic force microscopy Mechanical Engineering chemistry.chemical_element Condensed Matter Physics Trim Kapton Ion Ion implantation chemistry Mechanics of Materials General Materials Science Atomic physics Palladium
Zdroj:	Materials Science and Engineering: B. 45:25-29
ISSN:	0921-5107
DOI:	10.1016/s0921-5107(96)01901-0
Popis:	Surface damage caused in palladium and kapton by the implantation of 20 keV D2+ ions, fiuence- 1011 ions cm−2, has been investigated utilizing the technique of atomic force microscopy. TRIM program has been used to calculate the vacancies and interstitials created during implantation.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b3a656740ede348bcd4039ccbbd329a4 https://doi.org/10.1016/s0921-5107(96)01901-0 Zobrazit plný text záznamu Full Text from ScienceDirect