A pulsed laser ablation/plasma chemical vapor deposition tandem system for combinatorial device fabrication

Autor:	Nobuyuki Matsuki, Hiroshi Fujioka, Yoshiya Abiko, Kaori Miyazaki, Manabu Kobayashi, Hideomi Koinuma
Rok vydání:	2004
Předmět:	Materials science Fabrication Silicon business.industry Field effect chemistry.chemical_element Nanotechnology General Chemistry Chemical vapor deposition Pulsed laser deposition law.invention Semiconductor chemistry law Solar cell General Materials Science Thin film business
Zdroj:	Applied Physics A. 79:1413-1416
ISSN:	1432-0630 0947-8396
DOI:	10.1007/s00339-004-2796-6
Popis:	In electronic device fabrication, we frequently encounter the situations to deposit thin films of semiconductors, ceramics, and metals sequentially. Since the appropriate methods for depositing these films are frequently different, it should be beneficial for the research of new devices to develop a system that enables the depositions of different films not only sequentially but also in parallel by the procedure as prescribed. In this paper, we report on a tandem system composed of a pulsed laser deposition (PLD) and two plasma chemical vapor deposition (PCVD) chambers and its application in the fabrication of a prototype structure directed towards the field effect a-Si:H solar cell. PLD and PCVD were used to deposit conductive and semiconductive/insulative film layers, respectively. An exchangeable masking scheme was designed and installed in the system so we could make several device structures in parallel and quickly optimize the device and process parameters by the combinatorial methodology.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b3a1f57f32e5c7646561095afb39a4cc https://doi.org/10.1007/s00339-004-2796-6 Zobrazit plný text záznamu Plný text ve formátu PDF