Fabrication of Device-Quality Wide-Gap a-Si:H Films at Very Low Substrate Temperatures

Autor: Shinya Tsuda, Yukinori Kuwano, Sadaji Tsuge, Shoichi Nakano, Michitoshi Ohnishi, Noboru Nakamura, Yoshihiro Hishikawa
Rok vydání: 1990
Předmět:
Zdroj: MRS Proceedings. 192
ISSN: 1946-4274
0272-9172
DOI: 10.1557/proc-192-511
Popis: Wide-gap a-Si:H films with device quality (Tauc’s optical gap > 1.9eV, σph under AMI.5, 100mW/cm2 illumination ≥ 10−5, Ω−1cm−1, a σph/σ a≥106) have been fabricated. These films are deposited at low substrtate temperatures (TS≤80°C ) either by diluting SiH4 with H2 or optimizing the plasma parameters in a capacitively–coupled RF plasma–CVD reactor. Reduction in the SiH2 bond density and the ESR spin density are also observed. In this study, good film quality is always accompanied by a small deposition rate. Furthermore, σph is nearly the same if the deposition rate and Ts is the same, regardless of other deposition parameters. This suggests that the surface reactions or structural relaxations at the film-growing surface can produce high–quality a–Si:H films even at low TsS, if the deposition rate is low. Results in thermal annealing, light exposure, and solar cell performance confirm that these films have device quality and wide bandgap.
Databáze: OpenAIRE
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