Thin-Film Deposition With Refractory Materials Using a Vacuum Arc
| Autor: | Raymond L. Boxman, D. Arbilly, Isak I. Beilis, Yefim Yankelevich, Y. Koulik |
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| Rok vydání: | 2015 |
| Předmět: | |
| Zdroj: | IEEE Transactions on Plasma Science. 43:2323-2328 |
| ISSN: | 1939-9375 0093-3813 |
| DOI: | 10.1109/tps.2015.2432577 |
| Popis: | Refractory metal plasma generated by a vacuum arc was used to deposit thin films with different arc currents $I$ . The deposition rate $V_{\rm dep}$ was measured for electrode configurations including a planar Zr cathode and a planar W anode; cylindrical W or Mo electrode pairs and a cylindrical Nb cathode closed by a BN plate and a W or Nb shower-head cup anode or with one-hole Ta cup anode. $V_{\rm dep}$ for a Mo electrode pair with $I=275$ A at a distance $L=110$ mm from the electrode axis reached 2.2 $\mu \text{m}$ /min, 60 s after arc ignition. For the W electrode pair $V_{\rm dep}$ was $\sim 1\mu \text{m}$ /min at 80 s ( $I=200$ A and $L=110$ mm), while for W film deposition with shower-head anode $V_{\rm dep}$ was $\sim 0.6\mu \text{m}$ /min ( $I=200$ A and $L=60$ mm). For Nb films deposited with the closed electrode configuration, $V_{\rm dep}$ was 0.3 $\mu \text{m}$ /min at 30 s after arc ignition ( $I=275$ A and $L=80$ mm from the anode front). |
| Databáze: | OpenAIRE |
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