A mechanical model of amorphization under ion bombardment

Autor:	David Tetelbaum, Yu. A. Mendeleva
Rok vydání:	2004
Předmět:	Materials science Fragmentation (mass spectrometry) Silicon chemistry Solid-state physics chemistry.chemical_element Atomic physics Paracrystalline Condensed Matter Physics Ion bombardment Molecular physics Electronic Optical and Magnetic Materials Amorphous solid
Zdroj:	Physics of the Solid State. 46:2026-2029
ISSN:	1090-6460 1063-7834
DOI:	10.1134/1.1825544
Popis:	A mechanical model is proposed for the amorphization of solids. The model is based on a concept according to which the accumulation of radiation-induced defects gives rise to forces and force moments that act on local volumes of the material and are responsible for fragmentation. The estimates obtained demonstrate that the proposed model can adequately describe the amorphization of solids only with allowance made for strain waves generated during reactions between defects. This model is consistent with the paracrystalline structure of silicon layers transformed into the amorphous state under ion bombardment.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b2dbd333601001564135e7c6303db5e0 https://doi.org/10.1134/1.1825544 Zobrazit plný text záznamu Full text from SpringerLink