Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography

Autor:	Man-Hyoung Ryoo, Sang-Jun Choi, Han-Ku Cho, Mitsuhiro Hata
Rok vydání:	2006
Předmět:	Solvent Materials science Polymers and Plastics Chemical engineering Silicon chemistry Group (periodic table) Organic Chemistry Polymer chemistry Materials Chemistry chemistry.chemical_element Lithography Immersion lithography
Zdroj:	Journal of Photopolymer Science and Technology. 19:579-583
ISSN:	1349-6336 0914-9244
Popis:	Novel alkaline developable top-coat materials containing a bulky silicon group are presented. This bulky silicon group endows transparency at 193nm wavelength and hydrophobicity to the top-coat. Good pattern profiles and negligible changes of lithographic performance are confirmed on ArF photoresists. Receding angle of this top-coat is 90o, which is the highest among alkaline developable top-coats reported to date, and only comparable by solvent soluble-typetop-coat TSP3A.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b2a4166bb4ba1a2fdba8357c177d4e2a https://doi.org/10.2494/photopolymer.19.579 Zobrazit plný text záznamu