Electron Scattering at Epitaxial Ni(001) Surfaces

Autor: Pengyuan Zheng, Erik Milosevic, Daniel Gall
Rok vydání: 2019
Předmět:
Zdroj: IEEE Transactions on Electron Devices. 66:4326-4330
ISSN: 1557-9646
0018-9383
DOI: 10.1109/ted.2019.2934636
Popis: Epitaxial Ni(001) layers are sputter deposited on MgO(001) substrates and their electrical resistivity $\rho $ measured in situ as a function of thickness ${d}_{{\text {Ni}}}= $ 5–100 nm to quantify the resistivity size effect due to electron surface scattering. X-ray diffraction $\theta $ – ${2}\theta $ scans, $\omega $ -rocking curves, and pole figures confirm an epitaxial layer-substrate relationship with Ni[001] $\|$ MgO[001] and Ni[100] $\|$ MgO[100]. The resistivity is well described with the semiclassical model by Fuchs and Sondheimer and a room-temperature bulk resistivity $\rho _{o}= {7.04}\,\,\mu \Omega $ cm, yielding a bulk electron mean-free path $\lambda = {26}\pm {2}$ and 350 ± 20 nm at 295 and 77 K, respectively. Air exposure causes a resistivity increase by up to 21%, which is attributed to monolayer surface oxidation that results in a transition from 30% specular to completely diffuse electron surface scattering. All measured data are consistent with a temperature-independent product $\rho _{o} \lambda = {18.3} \times {10}^{{-{16}}}\,\,\Omega \text{m}^{{{2}}}$ , which is 4.5 times larger than previously predicted from first-principles, indicating that Ni is less promising as a metal for narrow interconnect lines than those predictions suggest.
Databáze: OpenAIRE