Soft x-ray: novel metrology for 3D profilometry and device pitch overlay

Autor:	Christina L. Porter, Teis Coenen, Niels Geypen, Sandy Scholz, Loes van Rijswijk, Han-Kwang Nienhuys, Jeroen Ploegmakers, Johan Reinink, Hugo Cramer, Rik van Laarhoven, David O'Dwyer, Peter Smorenburg, Andrea Invernizzi, Ricarda Wohrwag, Hugo Jonquiere, Juliane Reinhardt, Omar El Gawhary, Simon G. J. Mathijssen, Peter D. Engblom, Heidi Chin, William T. Blanton, Sury Ganesan, Brian J. Krist, Florian Gstrein, Mark Phillips
Rok vydání:	2023
Zdroj:	Metrology, Inspection, and Process Control XXXVII.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b27f24e445e7420276b78ecc827d09a6 https://doi.org/10.1117/12.2658495 Zobrazit plný text záznamu