Key components technology update of the 250W high-power LPP-EUV light source
| Autor: | Takeshi Okamoto, Tsukasa Hori, Yutaka Shiraishi, Yukio Watanabe, Taku Yamazaki, Hiroaki Nakarai, Hakaru Mizoguchi, Takashi Saitou, Takeshi Kodama, Hiroshi Tanaka, Krzysztof M. Nowak, Tamotsu Abe, Yasufumi Kawasuji, Shinji Okazaki |
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| Rok vydání: | 2017 |
| Předmět: |
Materials science
business.industry Extreme ultraviolet lithography 02 engineering and technology Semiconductor device 021001 nanoscience & nanotechnology Laser 01 natural sciences law.invention 010309 optics Generator (circuit theory) Wavelength Optics Semiconductor law Extreme ultraviolet Control system 0103 physical sciences Optoelectronics 0210 nano-technology business |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.2257808 |
| Popis: | 13.5nm wavelength, CO2-Sn-LPP EUV light source which is the most promising solution for the source capable of enabling high-volume-manufacturing of semiconductor devices with critical layers patterned with sub-10nm resolution. Our source incorporates unique and original technologies such as; high power short pulse CO2 laser, short wavelength solid-state pre-pulse laser, highly stabilized droplet generator, a laser-droplet shooting control system and debris mitigation technology utilizing a strong magnetic field. In this paper we present a technology update on the key components of our 250W CO2-Sn-LPP EUV light source. |
| Databáze: | OpenAIRE |
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