High pressure and high temperature in situ X-ray diffraction study on the structural stability of tantalum disilicide

Autor:	Zhenhai Yu, C.Y. Li, Tianquan Lü, Hongchen Liu
Rok vydání:	2013
Předmět:	Diffraction In situ Materials science Analytical chemistry Hexagonal phase Tantalum chemistry.chemical_element General Chemistry Condensed Matter Physics Crystallography chemistry Structural stability Phase (matter) Metastability X-ray crystallography Materials Chemistry
Zdroj:	Solid State Communications. 157:1-5
ISSN:	0038-1098
Popis:	The structural stability in TaSi2 was investigated by in situ angle dispersive X-ray diffraction (AD-XRD), which shows that the structure is stable even up to about 50.0 GPa at room temperature. However, under high pressure and high temperature (HPHT) conditions it was revealed that TaSi2 could undergo a structural phase transition from a C40-type hexagonal phase to a metastable phase after a temperature quench from 573 K at 10.6 GPa.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b19f5da1f453f81c560c0c8b4e1d4c25 https://doi.org/10.1016/j.ssc.2012.12.020 Zobrazit plný text záznamu Full Text from ScienceDirect