Autor: |
Yutaka Sawada, Mieko Ide, Azusa Shida, M. Sano, T. Aoyama, N. Miyabayashi, Shigeyuki Seki, Yoichi Hoshi, M Ogawa, H. Yoshida |
Rok vydání: |
2002 |
Předmět: |
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Zdroj: |
Journal of Thermal Analysis and Calorimetry. 69:1021-1028 |
ISSN: |
1418-2874 |
DOI: |
10.1023/a:1020649232003 |
Popis: |
Tin-doped In2O3 (indium-tin-oxide) transparent conducting films are widely used as electrodes of liquid crystal displays and low-E windows. In the present study, a systematic TDS study was undertaken for ITO films fabricated by various deposition processes; such as PVD, dip coating and spray deposition. Water vapor was the main gas evolved from the films; gas evolution from the silicon substrate was negligible. The evolution proceeded via two steps at approximately 373 and 473-623 K. The amount of the evolved water was in the order: (dip-coated film)>(PVD films)> (spray-deposited film). This order was identical to that of the film's resistivities. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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