Dissociative photoionization of EUV lithography photoresist models
| Autor: | Marziogiuseppe Gentile, Marius Gerlach, Robert Richter, Michiel J. van Setten, John S. Petersen, Paul A. W. van der Heide, Fabian Holzmeier |
|---|---|
| Rok vydání: | 2023 |
| Zdroj: | Advances in Patterning Materials and Processes XL. |
| DOI: | 10.1117/12.2657702 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|