Directed self-assembly patterning for forming fin field effect transistors

Autor:	Richard A. Farrell, Fee Li Lie, Michael A. Guillorn, Hoa Truong, Elliott Franke, Sean D. Burns, Matthew E. Colburn, Akiteru Ko, Mark Somervell, Nelson Felix, John C. Arnold, David Hetzer, Hsinyu Tsai, Stuart A. Sieg, Kafai Lai, Chi-Chun Liu, Daniel P. Sanders
Rok vydání:	2016
Předmět:	Directed self assembly Materials science Fin business.industry Optoelectronics Field-effect transistor business
Zdroj:	SPIE Newsroom.
ISSN:	1818-2259
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b0f7f1588d44e7df8463769208c909dc https://doi.org/10.1117/2.1201606.006519 Zobrazit plný text záznamu