Effect of Aluminum Stress on Onion (Allium cepa L.)
Autor: | Peni Astrini Notodarmojo, Trimurti Hesti Wardini |
---|---|
Rok vydání: | 2019 |
Předmět: | |
Zdroj: | Jurnal Matematika dan Sains. 24:1-7 |
ISSN: | 2442-7349 0854-5154 |
Popis: | This study analyzed the effect of Aluminium (Al) on onion (Allium cepa) root growth and its defense response. The experiment was carried out by exposing onion to 10, 100, 500 and 1000 µM AlCl3 for 24, 48 and 72 hour. Parameters observed were root length and diameter, root tip mitotic index, cortical parenchyma cell length and cortical cell layer thickness. Onion defense response observed by measuring mallic, citric and oxalic acid quantitatively, and the accumulation of Al and callose in root qualitatively. Results showed that an increase in the concentration of Al caused a decrease in root length. At concentrations up to 100 µM, Al increased root diameter cell length whilst at higher concentrations, Al decreased both parameters. Compared to control, all Al-treated root had lower index mitosis with 10 uM Al-treated root displayed highest IM. Since root treated with Al higher than 10 µM showed none or very low mitotic activity, chromosome aberration can only be observed in 10 uM Al–treated roots. Root defense response via Al and callose accumulation was increased with the increasing of Al concentrations. Organic acids were present in higher amounts in root than in medium with a ratio of 5000:1. Oxalic acid appeared to be the major organic acid that played a role in defense mechanisms against Al stress. Based on the results, it can be concluded that (1) Al3+ were toxic to Allium cepa because it caused root growth inhibition and chromosomal aberrations; (2) defense response for Al3+ stress were via the increase of callose as well as Al accumulation and organic acids content in root cells. |
Databáze: | OpenAIRE |
Externí odkaz: |