Monolithic fringe-field-activated crystalline silicon tilting-mirror devices
| Autor: | Chien-Shing Pai, P.A. Busch, W.Y.C. Lai, Joseph Ashley Taylor, Hyongsok Tom Soh, Dan M. Marom, J.E. Bower, F. Klemens, R. Cirelli, Chorng-Ping Chang, Sang Hyun Oh, T.W. Sorsch, Dennis S. Greywall |
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| Rok vydání: | 2003 |
| Předmět: |
Microelectromechanical systems
Materials science Silicon Physics::Instrumentation and Detectors business.industry Mechanical Engineering chemistry.chemical_element Silicon on insulator Computer Science::Other Optics Tilt (optics) chemistry Electrode Wafer Crystalline silicon Electrical and Electronic Engineering business Layer (electronics) |
| Zdroj: | Journal of Microelectromechanical Systems. 12:702-707 |
| ISSN: | 1057-7157 |
| Popis: | A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9/spl deg/ tilt range device array. |
| Databáze: | OpenAIRE |
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