Density relative change and interface zone mutual diffusion of BiFeO3 films prepared on Si (1 0 0), SiO2 and SiO2/Si (1 0 0)

Autor: Bo Li, HuaShan Su, Dejun Fu, RenZheng Xiao, JianJun Zhou, XianBao Yuan, Mao Zhangliang, Zesong Wang
Rok vydání: 2016
Předmět:
Zdroj: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 384:106-112
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2016.08.015
Popis: The mutual diffusion taken place in the interface zone between BiFeO3 (BFO) films and substrates (Si (1 0 0), SiO2 and SiO2/Si (1 0 0)) has been revealed by energy dispersive X-ray spectroscopy (EDS) and Rutherford Backscattering Spectrometry (RBS). RBS spectra provide the relative atomic concentrations of Bi, Fe, Si, and O elements changed with the samples’ depth as analyzed by RBS spectra fitting SIMNRA software. A certain width of the intermixing layer is probably formed between BFO films and individual substrate which is attributed to mutual diffusion in the interface zone during annealing process. The mechanism of concerted exchange component can explain the interface zone mutual diffusion phenomenon between BFO films and substrates. The width of the interface zone between BFO film and Si (1 0 0), SiO2, and SiO2/Si (1 0 0) substrate is about 1.94 × 1017, 2.01 × 1017 and 3.05 × 1017 atoms/cm2, respectively, which are equivalent to 30.9, 36.7, and 52.9 nm, respectively. It has been declared that the effect on density relative to BFO film is loosen or attenuation is presented in the interface zone, which can be interpreted as a migration or diffusion of various atoms during the annealing. This can also provide an evidence of atomic dynamics and defect engineering on interface diffusion.
Databáze: OpenAIRE
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