Microchannel water cooling of silicon x‐ray monochromator crystals
Autor: | E. Schmitt, W. H. Tompkins, C. Troxel, J. H. White, C. Henderson, J. Arthur, D. H. Bilderback, R. J. Contolini, T. Settersten |
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Rok vydání: | 1992 |
Předmět: | |
Zdroj: | Review of Scientific Instruments. 63:433-436 |
ISSN: | 1089-7623 0034-6748 |
DOI: | 10.1063/1.1142722 |
Popis: | The use in silicon x‐ray monochromator crystals of water cooling channels with dimensions optimized for efficient heat transfer from silicon to water has been investigated. Such channels are typically about 40 μm wide and 400 μm deep. Procedures have been found for reliably producing microchannel‐cooled crystals with very small amounts of residual strain. These crystals have been tested at a high‐power wiggler beam line at the Cornell High Energy Synchrotron Source, using an x‐ray beam having total power in excess of 250 W and normal‐incidence power density greater than 5 W/mm2. Under these conditions, the surface‐temperature rise of a typical microchannel‐cooled crystal was less than 5 °C, and degradation of the (111) rocking curve at 12 keV was very slight. The cooling efficiency is consistent with analytic calculations. |
Databáze: | OpenAIRE |
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