Microstructured reaction areas for the deposition of silica
| Autor: | Olaf Helmecke, Henning Menzel, Peter Behrens, Alexander Hirsch |
|---|---|
| Rok vydání: | 2007 |
| Předmět: |
Materials science
Polymers and Plastics Scanning electron microscope technology industry and agriculture respiratory system Microstructure Contact angle chemistry.chemical_compound Colloid and Surface Chemistry chemistry Chemical engineering Ellipsometry Polymer chemistry Materials Chemistry Physical and Theoretical Chemistry Thin film Deposition (law) Hydrophobic silica Acrylic acid |
| Zdroj: | Colloid and Polymer Science. 286:225-231 |
| ISSN: | 1435-1536 0303-402X |
| DOI: | 10.1007/s00396-007-1773-y |
| Popis: | Patterned films with hexagonal structures were prepared by photochemical grafting of hydrophobic poly(acrylic acid 2-ethyl-hexylester) (PEHAA) as barrier and poly(ethylene imine) (PEI) as reaction area. The films have been characterized by ellipsometry, contact angle measurements, and scanning electron microscopy (SEM). These patterned films have been used in silica mineralization experiments by dipping them into a silica precursor solution. Silica deposition occurs only in PEI-coated areas, resulting in regular arrays of lens-shaped silica particles. The deposited silica was investigated by SEM and atomic force microscopy (AFM). |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink