Study of surface morphology and refractive index of dielectric and metallic films used for the fabrication of monolithically integrated surface plasmon resonance biosensing devices
Autor: | Jan J. Dubowski, Dominic Lepage, Jacques Beauvais, Alvaro Jiménez |
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Rok vydání: | 2012 |
Předmět: |
Fabrication
Materials science business.industry Nanotechnology Chemical vapor deposition Dielectric Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Optical phenomena Optoelectronics Electrical and Electronic Engineering Surface plasmon resonance Thin film business Refractive index Quantum well |
Zdroj: | Microelectronic Engineering. 93:91-94 |
ISSN: | 0167-9317 |
DOI: | 10.1016/j.mee.2011.10.016 |
Popis: | Integration in a single chip using localized optical phenomena is one of the possible approaches to attain the accuracy, portability and affordability required for future biosensing devices. We address this problem by investigating a grating-coupled quantum well (QW) surface plasmon resonance (SPR) device that comprises a monolithically integrated source of light and a bio-sensitive surface. The successful operation of such a device requires, in addition to the optimization of its architecture, the use of high quality thin films with smooth surface morphology. Here, we present the results of studying a variety of dielectric and Au films intended for the fabrication of QW-SPR devices. For dielectrics, we found that SiO"2 films obtained by plasma-enhanced chemical vapor deposition have the best surface morphology and optical properties appropriate for our device. The films of Au fabricated with deposition rates exceeding 0.3nm/s exhibited relatively smooth surface morphology, however the presence of surface micro-inclusions reduced the attractiveness of such films. To avoid sample overheating that occurs at extremely slow deposition rates, we optimized the fabrication of Au films at 0.05 and 0.2nm/s. |
Databáze: | OpenAIRE |
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