Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N2/H2 Mixed Gas
| Autor: | Woojin Jeon, Cheol Hyun An, Sang Hyeon Kim, Cheol Seong Hwang, Dae Seon Kwon, Dong Gun Kim, Woongkyu Lee, Cheol Jin Cho |
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| Rok vydání: | 2019 |
| Předmět: |
Materials science
genetic structures Mixed gas Substrate (chemistry) 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences eye diseases 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials General Energy Chemical engineering sense organs Physical and Theoretical Chemistry Thin film 0210 nano-technology Layer (electronics) |
| Zdroj: | The Journal of Physical Chemistry C. 123:22539-22549 |
| ISSN: | 1932-7455 1932-7447 |
| Popis: | The growth behaviors of atomic-layer-deposited (ALD) Ru thin films using the RuO4 precursor and N2/H2 mixed reduction gas on Ta2O5 thin-film/Si substrates were examined. The Ru films deposited on t... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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