Correlation of plume dynamics and oxygen pressure with VO2 stoichiometry during pulsed laser deposition
Autor: | T. Kerdja, Y. Khereddine, S. Abdelli-Messaci, S. Lafane, O. Nemraoui, Mohamed Kechouane |
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Rok vydání: | 2012 |
Předmět: | |
Zdroj: | Applied Physics A. 112:159-164 |
ISSN: | 1432-0630 0947-8396 |
Popis: | Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of V2O5 target at the laser fluence of 2 J cm−2. The substrate temperature and the target-substrate distance were set to 500 ∘C and 4 cm, respectively. X-ray diffraction analysis showed that pure VO2 is only obtained at an oxygen pressure range of 4×10−3–2×10−2 mbar. A higher optical switching contrast was obtained for the VO2 films deposited at 4×10−3–10−2 mbar. The films properties were correlated to the plume-oxygen gas interaction monitored by fast imaging of the plume. |
Databáze: | OpenAIRE |
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