Correlation of plume dynamics and oxygen pressure with VO2 stoichiometry during pulsed laser deposition

Autor:	T. Kerdja, Y. Khereddine, S. Abdelli-Messaci, S. Lafane, O. Nemraoui, Mohamed Kechouane
Rok vydání:	2012
Předmět:	Diffraction Laser ablation Materials science Analytical chemistry General Materials Science General Chemistry Substrate (electronics) Thin film Fluence Stoichiometry Plume Pulsed laser deposition
Zdroj:	Applied Physics A. 112:159-164
ISSN:	1432-0630 0947-8396
Popis:	Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of V2O5 target at the laser fluence of 2 J cm−2. The substrate temperature and the target-substrate distance were set to 500 ∘C and 4 cm, respectively. X-ray diffraction analysis showed that pure VO2 is only obtained at an oxygen pressure range of 4×10−3–2×10−2 mbar. A higher optical switching contrast was obtained for the VO2 films deposited at 4×10−3–10−2 mbar. The films properties were correlated to the plume-oxygen gas interaction monitored by fast imaging of the plume.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::afd31d1c49246728ad06ffc51ddb158e https://doi.org/10.1007/s00339-012-7223-9 Zobrazit plný text záznamu Full text from SpringerLink