Characteristics of Nanocomposite ZrO2/Al2O3 Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Autor: Sun Jin Yun, Jung Wook Lim, Hyun-Tak Kim
Rok vydání: 2007
Předmět:
Zdroj: Journal of Nanoscience and Nanotechnology. 7:4180-4184
ISSN: 1533-4880
Popis: Nanocomposite ZrO2/Al2O3 (ZAO) films were deposited on Si by plasma-enhanced atomic layer deposition and the film characteristics including interfacial oxide formation, dielectric constant (k), and electrical breakdown strength were investigated without post-annealing process. In both the mixed and nano-laminated ZAO films, the thickness of the interfacial oxide layer (TIL) was considerably reduced compared to ZrO2 and Al2O3 films. The TIL was 0.8 nm in nano-composite films prepared at a mixing ratio (ZrO2:Al2O3) of 1:1. The breakdown strength and the leakage current level were greatly improved by adding Al2O3 as little as 7.9% compared to that of ZrO2 and were enhanced more with increasing content of Al2O3. The k of ZrO2 and mixed ZAO (Al2O3 7.9%) films were 20.0 and 16.5, respectively. These results indicate that the addition of Al2O3 to ZrO2 greatly improves the electrical properties with less cost of k compared to the addition of SiO2.
Databáze: OpenAIRE