Novel non‐chemically amplified resist utilizing interaction between hexafluoroisopropylalcohol‐containing styrene and photochemical acid generator

Autor:	Yuji Yada, Takashi Doi, Makoto Sugiura, Tsutomu Shimokawa, Kota Nishino
Rok vydání:	2020
Předmět:	chemistry.chemical_compound Generator (computer programming) Polymers and Plastics Resist Chemistry Materials Chemistry Physical and Theoretical Chemistry Photochemistry Styrene
Zdroj:	Journal of Polymer Science. 58:1062-1068
ISSN:	2642-4169 2642-4150
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::aeb55686028e6f567eb0b95a08188287 https://doi.org/10.1002/pol.20190280 Zobrazit plný text záznamu Plný text