Plasma-enhanced synthesis of carbon nanocone arrays by magnetic and electric fields coupling HFCVD
Autor: | Yijia Wang, Hangyu Long, Kechao Zhou, Jiaxin Li, Zhiming Yu, Naixiu Hu, Yunlu Jiang, Li Ma, Youneng Xie, Qiuping Wei, Zejun Deng |
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Rok vydání: | 2017 |
Předmět: |
Materials science
Field (physics) business.industry Analytical chemistry 02 engineering and technology Surfaces and Interfaces General Chemistry Plasma Chemical vapor deposition 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Magnetic field Field electron emission Carbon film Electric field Materials Chemistry Optoelectronics 0210 nano-technology business Carbon nanocone |
Zdroj: | Surface and Coatings Technology. 324:413-418 |
ISSN: | 0257-8972 |
DOI: | 10.1016/j.surfcoat.2017.06.008 |
Popis: | In this paper, magnetic and electric fields coupling hot filament chemical vapor deposition (HFCVD) was used to fabricate a series of carbon films varying from nanocrystalline diamonds (NCD) to carbon nanocone arrays. The surface morphology and composition of the film were examined by scanning electron microscopy and Raman spectroscopy. After adding magnetic field, the morphology of the as-grown NCD film was a serried form instead of a rugged topography obtained under the absence of magnetic field. As electric field intensity increased, the etching degree of NCD films enhanced and the structural transformation of NCD to microcrystalline graphite occurred. We proposed that magnetic and electric fields can effectively introduce plasma into HFCVD system to optimize the film deposition process and studied the impact of magnetic and electric fields. The presence of electric field promoted ionization of reactive gas, and magnetic field made these ionic gases bound to a certain area around the sample, increasing the regional density of plasma. Specially, unique carbon nanocone arrays were obtained by synergistic effect of magnetic and electric fields, which exhibited optimal electron field emission properties, showing the lowest turn-on field of 5.65 V/μm. |
Databáze: | OpenAIRE |
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