Interferometric lithography — from periodic arrays to arbitrary patterns
| Autor: | Xiaolan Chen, Z. Zhang, S. R. J. Brueck, S. H. Zaidi |
|---|---|
| Rok vydání: | 1998 |
| Předmět: |
Materials science
business.industry Resolution (electron density) Condensed Matter Physics Laser Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Wavelength Interferometry Optics law Optoelectronics Interferometric lithography Electrical and Electronic Engineering Photolithography business Next-generation lithography Line (formation) |
| Zdroj: | Microelectronic Engineering. :145-148 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/s0167-9317(98)00032-x |
| Popis: | Interferometric lithography is a simple technology for the production of very small features. Using I-line wavelength laser sources (364-nm Ar-ion or 355-nm tripled YAG lasers) dense (1:1 line:space ratio) periodic structures at 0.125-μm have been demonstrated. Mix-and-match with optical lithography has been demonstrated. Imaging interferometric lithography, a true integration between optical and interferometric lithographies, potentially provides a route to arbitrary structures with a resolution up to 130 nm (dense patterns) at I-line and 65 nm at a 193 nm exposure wavelength. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect