Metal Hard Mask Employed Cu/Low k Film Post Ash and Wet Clean Process Optimization and Integration into 65nm Manufacturing Flow
| Autor: | Miao Chun Lin, Mei Qi Wang, Joe Lai, Ren Huang, Cheng Ming Weng, J.H. Liao, Jian She Tang, Ching Hwa Weng, Wei Lu, Han Wen Chen, John T.C. Lee |
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| Rok vydání: | 2007 |
| DOI: | 10.4028/3-908451-46-9.359 |
| Databáze: | OpenAIRE |
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