Resist Stripping for Advanced FEOL Nodes: Improvements to Process Based on Ozone Diffusion by Use of Additives

Autor:	Didier Louis, Olivier Pollet, Jean Philippe Odet, E. Lajoinie, Sylviane Cetre, Marc Veillerot, O. Louveau, Béatrice Icard, Laurent Lachal, Evelyne Tabouret, Hervé Fontaine
Rok vydání:	2005
Předmět:	chemistry.chemical_compound Ozone Materials science Stripping (chemistry) Resist chemistry business.industry Analytical chemistry General Materials Science Condensed Matter Physics Process engineering business Atomic and Molecular Physics and Optics
Zdroj:	Solid State Phenomena. :301-304
ISSN:	1662-9779
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ad3d8ffdabc0cbae68ff850f241cf08e https://doi.org/10.4028/www.scientific.net/ssp.103-104.301 Zobrazit plný text záznamu