| Autor: |
Wyacheslaw Grimm, Yuri V. Miklyaev, Andreas Hildebrandt, Vitalij Lissotschenko, Mikhail Ivanenko, Klaus Bagschik, Alexei Mikhailov |
| Rok vydání: |
2008 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.762091 |
| Popis: |
Advanced laser crystallization of Si for flat panel displays demands a narrow line-shaped light focus with an ultimately high homogeneity. Key element of LIMO line shaping system is an anisotropic quality transformation of a multimode laser beam, which permits a very good homogenization for the long axis and tight focusing with a large depth of focus for the perpendicular high-quality axis. A prototype system has been built with a 90-W 532-nm DPSS laser. It provides a 59-mm long and down to 8 μm (FWHM) narrow focus with a residual inhomogeneity of only 1% (rms). The focus width is adjustable and its shape can be tuned from a quasi-Gauss to a top-hat intensity distribution. The depth of focus at 90% of the peak intensity DOF 0.9I varies from 120 μm for a line width of 8 μm to 275 μm for FWHM = 14 μm. The design of longer lines is in progress at LIMO. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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