Novel Nano-Fabrication Technique with Low Edge Roughness

Autor:	S. Hashioka, Hideki Matsumura, T. Mogi
Rok vydání:	2003
Předmět:	Fabrication Materials science Physics and Astronomy (miscellaneous) business.industry General Engineering General Physics and Astronomy Coulomb blockade Surface finish Edge (geometry) law.invention Optics Nanolithography law Nanometre Stepper Photolithography business
Zdroj:	Japanese Journal of Applied Physics. 42:4169-4172
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.42.4169
Popis:	This paper demonstrates the novel nano-fabrication technique usable in the mass-production with low cost and high through-put.. The F/sub 2/ stepper and the electron beam stepper are expected as future technologies for sub-0.1/spl mu/m node. However, such a stepper costs as much as about $ 20,000,000. Nano-scale devices such as a single electron transistor are sometimes fabricated by using a tip of an atomic force microscope (AFM). However, it does not appear as an industrially acceptable technique. Hence, if a novel method utilizing only conventional photolithographic technique is developed for nano-size fabrication, it surely opens the new stages. For its purpose, we have developed a new method, in which a contact patternmask with nanometer-size slits (nanometer slit mask) is fabricated by combining the conventional photolithography and anodic oxidation.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::accb778c620611b3dd4cba0810710ca5 https://doi.org/10.1143/jjap.42.4169 Zobrazit plný text záznamu