Increased Carbon Chemical Vapor Deposition and Carbon Nanotube Growth on Metal Substrates in Confined Spaces
Autor: | S. G. Lvov, E. F. Kukovitsky |
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Rok vydání: | 2012 |
Předmět: | |
Zdroj: | ECS Journal of Solid State Science and Technology. 2:M1-M8 |
ISSN: | 2162-8777 2162-8769 |
DOI: | 10.1149/2.016301jss |
Popis: | Experimental study of carbon deposition and carbon nanotube growth between stacked metallic substrates was conducted. The batch chemical vapor deposition (CVD) reactor was used with polyethylene as the carbon precursor. Increased carbon deposition was established on surfaces between stacked nickel substrates as compared to surfaces facing to open spaces. In general case carbon films deposited between substrates were not uniform giving rise to complicated profiles. The simple diffusion-reaction scheme gives carbon film thickness profiles closely resembling those experimentally observed. This similarity is considered as evidence of homogeneous-heterogeneous reaction sequences proceeding in narrow gap between catalytically active surfaces. Increased carbon nanotube growth was believed to occur as a result of the involvement of hydrocarbon radicals generated by the catalyst surface with subsequent release into the gas phase. Radicals accelerate gas-phase reactions providing reactive intermediates. Ultimately catalytic gas phase activation in the confined space promotes increased carbon formation. An explanation of the experimental results is proposed and a practical application was demonstrated. |
Databáze: | OpenAIRE |
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