Lowering the photoresist swing effect to increase the lithographic critical dimension uniformity: one step ahead in perfecting the dual damascene module

Autor:	Valentina Dall'Asta, Emma Litterio, Nicoletta Corneo, Bertrand Le-Gratiet, Tito F. Bellunato
Rok vydání:	2022
Zdroj:	Advances in Patterning Materials and Processes XXXIX.
DOI:	10.1117/12.2614005
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::acaa772467db1c1d0992e19f9c41d994 https://doi.org/10.1117/12.2614005 Zobrazit plný text záznamu