Application aspects of beam injection methods

Autor:	J.-F. Bresse
Rok vydání:	1994
Předmět:	Materials science Mechanics of Materials Mechanical Engineering Electronic engineering Analytical chemistry General Materials Science Sample (statistics) Orders of magnitude (voltage) Sensitivity (control systems) Condensed Matter Physics Image resolution Beam (structure)
Zdroj:	Materials Science and Engineering: B. 24:229-232
ISSN:	0921-5107
DOI:	10.1016/0921-5107(94)90334-4
Popis:	This paper gives guidelines to help those who want to characterize a semiconductor sample or device. A short overview of the existing beam injection techniques is presented. Orders of magnitude of spatial resolution and sensitivity are given for each technique when topographical, electrical or thermal properties are used. Perspectives for future use are also given, together with further improvement of the existing methods, and use of new techniques.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::aca57908c59f61375877670e18ce0c99 https://doi.org/10.1016/0921-5107(94)90334-4 Zobrazit plný text záznamu