Two-dimensional modeling and optimization of a neutral loop discharge etcher in an argon plasma

Autor: Chikahisa Honda, Yaw Okraku-Yirenkyi, Tatsuya Sakoda, Masahisa Otsubo, Youl-Moon Sung
Rok vydání: 2002
Předmět:
Zdroj: Surface and Coatings Technology. 149:185-191
ISSN: 0257-8972
DOI: 10.1016/s0257-8972(01)01440-2
Popis: In order to ascertain the optimal conditions for plasma generation in a magnetic neutral loop discharge (NLD), experiments were conducted to determine the electron temperature, Te and electron density, ne distributions around the NL. For the plasma production efficiency, the ion flux density measurements were done. The experimental results were examined by using a model that included effects of a three-dimensional electromagnetic field with spatial decay of the RF electric field, and the limitation of the spatial extent of the electron motion and collision effect. From the experiments and modeling of the electron behavior, it was found that NLD plasma possesses the electron temperature Te and density ne peaks around the NL and there existed an optimum value of the magnetic field gradient for efficient plasma production.
Databáze: OpenAIRE